SKU:33270325655
Mo Polycrystalline Substrate: 10 x 10 x 0.5mm, two sides polished - Mo-101005S2-P
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Ships within 48 hours · Estimated delivery Jul 13 - Jul 18
Description
Mo Polycrystalline Substrate: 10 x 10 x 0.5mm, two sides polished - Mo-101005S2-PPolycrystallline Mo substrate Purity: 99. 9% Substrate dimension: 10 x 10 x 0. 5 mm Polishing: two sides polished Related Product Metallic Substrate A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater
Electrical conductivity (bulk)
Hardness: 5
Through several years of effort
Polished surface: Wafer surface is EPI polished via a special CMP procedure
(if you need Compact Digital Vacuum Gauge
This is an excellent tool to make quality film for material research laboratories for ceramic tape casting
Length: 56mm
"A Review of Metallic Bipolar Plates for Proton Exchange Membrane Fuel Cells: Materials and Fabrication Methods" Accepted: 13 June 2012
and one of the advantage from water-based (Aqueous) chemistry is it isn't prone to catching fire
Elongation Rate (RT): 4
It is safer and faster than to push down along the cut-off saw
with Pattern
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Exchange/Return Notes
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- Final sale items are not eligible for returns or exchanges.
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