MgO (100) Epi polishing wafer 2" Dia x0.5mm, 2SP - MGa50D05C2US

MgO (100) Epi polishing wafer 2" Dia x0.5mm, 2SP - MGa50D05C2USSpecifications of MgO substrate Size: 2" diameter x 0. 5mm + _ 0. 05 mm Orientation: (100) + 0. 5 Deg Polish: Two sides EPI polished by CMP technology with minimum sub surface damage. Surface finish (RMS or Ra): < 10A Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting method and nature

working temperature 1750 oC Warning Please don't use alumina tube under vacuum at temperature > 1500 oC

Heating Rate

Maximum Cyclindrical Cell Size:

5 kg | 14

polyester cartridge

The specially designed demolding is used to de-mold 32 samples at the same time

1 HP Ultra Quiet and Oil-Free Steel Tank Air Compressor with connection kit - EQ-ACPHD-3-LD

which will make the diamond blade cut more efficiently and keep the machine from corrosion

Coefficient of Linear Thermal Expansion (x10^-6/K)

Size:  10 x 10 x 0

Resistivity:                     > 50 Ohms/cm

Note:  EPI ready wafers