Graphene film on Ni/SiO2/Si 100mm dia,

Graphene film on Ni/SiO2/Si 100mm dia,Graphene films are grown directly on a Ni SiO2 Si deposited on an oxidized silicon wafer usinga CVD process. Specifications: Research Grade , about 90 % useful area Wafer Size: 100 mm diameter Growth Method: Chemical Vapor Deposition (CVD) Technique Film thickness: 1 10 monolayer thick Graphene film is multilayer with thickness varying in the range 1 10 layers; Graphene layers are aligned relative to each (graphite like A B stacking ) other as

you may consider MTI micro-vibration mill or Auto-grinder as Pic d below-right 2

Wafer Size:                  5x5x0

No warranty for the tube

Conductor type:                         S-C-N

6mm Case Dimension

Flow Cell Diagram        Photo Credit: Rahman

Glove Port Cover Gasket for VGB-1 -  GB1GP-Sor

Compliance Vacuum gauge is ETL certified

the glove box moisture can be kept below 180 ppm and oxygen below 200 ppm

Orientation: C-axis[0001] +-0

To use outside the glove box

and heat insulation materials are not covered by the warranty